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Scios microscope

Manufactured by Thermo Fisher Scientific
Sourced in United States

The Scios microscope is a high-performance scanning electron microscope (SEM) designed for advanced materials analysis. It features a high-resolution electron beam and sophisticated imaging capabilities, enabling detailed observation and characterization of a wide range of samples.

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5 protocols using scios microscope

1

Structural Analysis of PAN-based CNF

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The structure of the composite еlectrospun polyacrylonitrile-based CNF was investigated by the methods of scanning electron microscopy (SEM) using a FEI Scios microscope (FEI, Hillsboro, OR, USA), transmission electron microscopy (TEM), high-resolution transmission electron microscopy (HR TEM), scanning transmission electron microscopy with a high-angle annular dark-field detector (HAADF STEM) and energy-dispersive X-ray spectroscopy (EDX) elemental mapping using a Thermo Fisher Scientific Osiris (Waltham, MA, USA) equipped with a high-angle annular dark field (HAADF) detector and Super-X EDX detection system based on Silicon Drift Detector (SDD) technology. Electron microscope images were analyzed using Digital Micrograph (GMS 3, Gatan, Pleasanton, CA, USA), TIA (TIA 16, Siemens AG, Munich, Germany), Esprit (Esprit 2, Bruker, Billerica, MA, USA) and JEMS software (P. Stadelmann JEMS—EMS Java version 2004 EPFL, Lausanne, Switzerland). For electron microscopy studies, the samples of CNF were well-dispersed in acetone to separate the fibers using an ultrasonic bath for 20–30 min. Then, the obtained suspensions were introduced onto copper lacey carbon grids.
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2

Cellulose Membrane Morphology Analysis

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The study of the morphology of cellulose and composite membranes was conducted on dry samples. The morphology of the membranes’ transverse cleavages was investigated by low-voltage scanning electron microscopy (LVSEM) on an FEI Scios microscope (Waltham, MA, USA) at an accelerating voltage of less than 1 kV in the secondary electron mode [33 (link)]. Cleavages were formed after freezing in liquid nitrogen perpendicular to the plane of the sample.
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3

Nanocomposite Structural Analysis by Electron Microscopy

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The solution with CNF was applied onto standard copper grids with a holed amorphous carbon film and subsequently dried under normal conditions. The structure of nanocomposites was investigated by the methods of scanning electron microscopy (SEM) using an FEI Scios microscope (FEI, Hillsboro, OR, USA), transmission electron microscopy (TEM), high-resolution transmission electron microscopy (HRTEM), scanning transmission electron microscopy with a high-angle annular dark-field detector (HAADF STEM), electron diffraction, energy-dispersive X-ray analysis (EDX), and elemental mapping using a FEI Titan 80–300 microscope and a FEI Tecnai Osiris (FEI, Hillsboro, OR, USA) with accelerating voltage of 200 kV equipped with a special SuperX EDS system including four silicon detectors for rapid obtaining of chemical distribution maps. Electron microscope images were analyzed using Digital Micrograph (GMS 3, Gatan, Pleasanton, CA, USA), Esprit (Esprit 2, Bruker, Billerica, MA, USA), TIA (TIA 16, Siemens AG, Munich, Germany) and JEMS software (P. Stadelmann JEMS—EMS Java version 2004 EPFL, Lausanne, Switzerland).
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4

Gel Microstructure Visualization

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The gel structure was visualized by scanning electron microscopy using a FEI Scios microscope at 2 kV in the secondary electron mode using an Everhart–Thornley detector (ETD) and a FEI Quanta 200 3D microscope at 20 kV in the environmental mode at a pressure of 50 Pa using a large field detector (LFD).
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5

Dual-Beam Electron-Ion Microscopy of Compacted Diamond

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The method of dual-beam electron ion microscopy (on a Scios microscope, FEI, USA) was used to record the images of the compacted diamond-containing sample and the lamella, as well as to cut out the lamella and transfer it into the Push-to-Pull device. Inside the microscope, the sample was transferred from the prepared lamella to a special microchip using a micromanipulator (a 5 µm × 2 µm region was cut out from the sample by the ion beam). Since the sample was very sensitive to ion irradiation, only electron irradiation was used for transferring the samples and determining the positions where they should be fixed. Once the sample had been transferred and fixed, a “dumbbell” shape required to control sample elongation during the tensile test was cut out by etching with gallium ions using a tailored mask. As a result, the 1 µm × 0.5 µm area was selected for the experiment, where sample rupture took place.
The bright-field TEM images of the sample structure, selected area diffraction patterns (SADPs), and convergent beam electron diffraction (CBED) patterns were recorded on a Jeol JEM 2100 transmission electron microscope (Jeol, Japan) operating at 200 kV.
The images and video were recorded using an Olympus Quemesa CCD camera (Germany) at a rate of 4 frames per second.
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